发明授权
US07842336B2 Method of forming overcoat layer, method of producing color filter substrate, and color filter substrate and liquid crystal display produced using same
有权
形成覆盖层的方法,制造滤色器基板的方法以及使用其制造的滤色器基板和液晶显示器
- 专利标题: Method of forming overcoat layer, method of producing color filter substrate, and color filter substrate and liquid crystal display produced using same
- 专利标题(中): 形成覆盖层的方法,制造滤色器基板的方法以及使用其制造的滤色器基板和液晶显示器
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申请号: US11627058申请日: 2007-01-25
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公开(公告)号: US07842336B2公开(公告)日: 2010-11-30
- 发明人: Jin-Won Park , Ji-Won Sohn , Seung-Beom Park , Seon-Ah Cho
- 申请人: Jin-Won Park , Ji-Won Sohn , Seung-Beom Park , Seon-Ah Cho
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 代理机构: H.C. Park & Associates, PLC
- 优先权: KR10-2006-0099516 20061012
- 主分类号: B05D5/06
- IPC分类号: B05D5/06
摘要:
The invention relates to a method of forming an overcoat layer, containing a hydrophobic functional group and a hydrophilic functional group, that omits a post-treatment process after the overcoat layer is formed. The invention also relates to a method of producing a color filter substrate, as well as a color filter substrate and a liquid crystal display produced using the same. The method of forming an overcoat layer includes adding an initiator to polymerizable surfactant monomers, coating the polymerizable surfactant monomers, polymerizing the coated polymerizable surfactant monomers, and forming the overcoat layer through a polymerization reaction of the polymerizable surfactant monomers.
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