发明授权
- 专利标题: Imaging device by buried photodiode structure
- 专利标题(中): 成像装置采用掩埋光电二极管结构
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申请号: US11577546申请日: 2005-10-18
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公开(公告)号: US07842978B2公开(公告)日: 2010-11-30
- 发明人: Shoji Kawahito
- 申请人: Shoji Kawahito
- 申请人地址: JP Shizuoka-shi
- 专利权人: National University Corporation Shizuoka University
- 当前专利权人: National University Corporation Shizuoka University
- 当前专利权人地址: JP Shizuoka-shi
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2004-303983 20041019
- 国际申请: PCT/JP2005/019464 WO 20051018
- 国际公布: WO2006/043697 WO 20060427
- 主分类号: H01L31/113
- IPC分类号: H01L31/113
摘要:
An n-type region as a charge storage region of a photodiode is buried in a substrate. The interface between silicon and a silicon oxide film is covered with a high concentration p-layer and a lower concentration p-layer is formed only in the portion immediately below a floating electrode for signal extraction. Electrons generated by light are stored in the charge storage region, thereby changing the potential of the portion of the p-layer at the surface of the semiconductor region. The change is transmitted through a thin insulating film to the floating electrode by capacitive coupling and read out by a buffer transistor. Initialization of charges is executed by adding a positive high voltage to the gate electrode of a first transfer transistor such that the electrons stored in the charge storage region are transferred to the n+ region and generation of reset noise is protected.
公开/授权文献
- US20080277700A1 Imaging Device by Buried Photodiode Structure 公开/授权日:2008-11-13
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