Invention Grant
- Patent Title: Apparatus and method for thermal management using vapor chamber
- Patent Title (中): 使用蒸气室进行热管理的设备和方法
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Application No.: US12169793Application Date: 2008-07-09
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Publication No.: US07843695B2Publication Date: 2010-11-30
- Inventor: Wei Yang , Steven J. Eickhoff , Chunbo Zhang , Alex Gu , J. David Zook
- Applicant: Wei Yang , Steven J. Eickhoff , Chunbo Zhang , Alex Gu , J. David Zook
- Applicant Address: US NJ Morristown
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morristown
- Agency: Munck Carter, LLP
- Main IPC: H05K7/20
- IPC: H05K7/20 ; H01L23/34 ; H01L23/367 ; F28D15/00

Abstract:
An apparatus includes a plurality of islands each carrying multiple cantilevers. The apparatus also includes a fluidic network having a plurality of channels separating the islands. The channels are configured to provide fluid to the islands, and the fluid at least partially fills spaces between the cantilevers and the islands. Heat from the islands vaporizes the fluid filling the spaces between the cantilevers and the islands to transfer the heat away from the islands while driving the cantilevers into oscillation. The apparatus may also include a casing configured to surround the islands and the fluidic network to create a vapor chamber, where the vapor chamber is configured to retain the vaporized fluid. The islands and the fluidic network could be formed in a single substrate, or the islands could be separate and attached together by a binder located within the channels of the fluidic network.
Public/Granted literature
- US20090020271A1 APPARATUS AND METHOD FOR THERMAL MANAGEMENT USING VAPOR CHAMBER Public/Granted day:2009-01-22
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