发明授权
- 专利标题: Memory cell of a resistive semiconductor memory device, a resistive semiconductor memory device having a three-dimensional stack structure, and related methods
- 专利标题(中): 电阻半导体存储器件的存储单元,具有三维堆叠结构的电阻半导体存储器件及相关方法
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申请号: US12015624申请日: 2008-01-17
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公开(公告)号: US07843715B2公开(公告)日: 2010-11-30
- 发明人: Joon-Min Park , Sang-Beom Kang , Hyung-Rok Oh , Woo-Yeong Cho
- 申请人: Joon-Min Park , Sang-Beom Kang , Hyung-Rok Oh , Woo-Yeong Cho
- 申请人地址: KR Suwon-si, Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si, Gyeonggi-do
- 代理机构: Volentine & Whitt, PLLC
- 优先权: KR10-2007-0006859 20070123
- 主分类号: G11C5/02
- IPC分类号: G11C5/02
摘要:
A memory cell of a resistive semiconductor memory device, a resistive semiconductor memory device having a three-dimensional stack structure, and related methods are provided. The memory cell of a resistive semiconductor memory device includes a twin cell, wherein the twin cell stores data values representing one bit of data. The twin cell includes a main unit cell connected to a main bit line and a word line, and a sub unit cell connected to a sub bit line and the word line. Also, the main unit cell includes a first variable resistor and a first diode, and the sub unit cell includes a second variable resistor and a second diode.
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