发明授权
- 专利标题: Device and method for optical nanoindentation measurement
- 专利标题(中): 光学纳米压痕测量的装置和方法
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申请号: US12230340申请日: 2008-08-28
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公开(公告)号: US07845214B2公开(公告)日: 2010-12-07
- 发明人: Jiong-Shiun Hsu , Hui-Ching Lu , Chung-Lin Wu , Sheng-Jui Chen
- 申请人: Jiong-Shiun Hsu , Hui-Ching Lu , Chung-Lin Wu , Sheng-Jui Chen
- 申请人地址: TW Hsinchu
- 专利权人: Industrial Technology Research Institute
- 当前专利权人: Industrial Technology Research Institute
- 当前专利权人地址: TW Hsinchu
- 代理机构: Bacon & Thomas, PLLC
- 优先权: TW96150224A 20071226
- 主分类号: G01N3/48
- IPC分类号: G01N3/48
摘要:
This invention relates to a device and method for optical nanoindentation measurement, according to which respective measurement results are obtained by having an indenter tip apply load to a fixed portion of a thin film, having an indenter tip apply load to a non-fixed portion of a thin film, and having a vibrating component transmit the dynamic properties of the vibration to the thin film. By combining the above measurement results in calculations, the Young's modulus, the Poisson's ratio, and the density of the thin film can be obtained.
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