发明授权
- 专利标题： Charged particle beam apparatus
- 专利标题（中）： 带电粒子束装置
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申请号： US12068417申请日： 2008-02-06
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公开(公告)号： US07847249B2公开(公告)日： 2010-12-07
- 发明人: Noritsugu Takahashi , Muneyuki Fukuda , Hiroyuki Ito , Atsuko Fukada , Masashi Sakamoto , Satoshi Takada
- 申请人： Noritsugu Takahashi , Muneyuki Fukuda , Hiroyuki Ito , Atsuko Fukada , Masashi Sakamoto , Satoshi Takada
- 申请人地址： JP Tokyo
- 专利权人： Hitachi High-Technologies Corporation
- 当前专利权人： Hitachi High-Technologies Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Stites & Harbison, PLLC
- 代理商 Juan Carlos A. Marquez, Esq
- 优先权： JP2007-027488 20070207
- 主分类号： H01J3/14
- IPC分类号： H01J3/14
摘要：
A technology whereby removal of magnetic hysteresis is enabled in short time in parallel with a process for stage transfer, and so forth. There is executed a magnetic hysteresis removal sequence whereby current for exciting an electromagnetic coil prior to acquisition of an image is always set to a predetermined variation value against a target value, thereby obtaining information on an image, and so forth, when a diameter of a primary electron beam, converged on the specimen, becomes smaller than dimensions displayed by one pixel of an image to be acquired.
公开/授权文献
- US20080185519A1 Charged particle beam apparatus 公开/授权日：2008-08-07