发明授权
- 专利标题: Non-volatile semiconductor storage device and method of manufacturing the same
- 专利标题(中): 非易失性半导体存储装置及其制造方法
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申请号: US12403919申请日: 2009-03-13
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公开(公告)号: US07847334B2公开(公告)日: 2010-12-07
- 发明人: Ryota Katsumata , Masaru Kito , Hiroyasu Tanaka , Masaru Kidoh , Yoshiaki Fukuzumi , Hideaki Aochi , Yasuyuki Matsuoka
- 申请人: Ryota Katsumata , Masaru Kito , Hiroyasu Tanaka , Masaru Kidoh , Yoshiaki Fukuzumi , Hideaki Aochi , Yasuyuki Matsuoka
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2008-065882 20080314
- 主分类号: H01L29/788
- IPC分类号: H01L29/788
摘要:
A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings comprises: a first columnar semiconductor layer extending in a vertical direction to a substrate; a charge accumulation layer formed around the first columnar semiconductor layer via a first insulation layer; and a first conductive layer formed around the charge accumulation layer via a second insulation layer. Each of the first conductive layers is formed to expand in a two-dimensional manner, and air gaps are formed between the first conductive layers located there above and there below.
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