发明授权
- 专利标题： Lens array, an exposure head and an image forming apparatus
- 专利标题（中）： 透镜阵列，曝光头和图像形成装置
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申请号： US12357231申请日： 2009-01-21
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公开(公告)号： US07848023B2公开(公告)日： 2010-12-07
- 发明人: Ryuta Koizumi , Yujiro Nomura , Takeshi Sowa
- 申请人： Ryuta Koizumi , Yujiro Nomura , Takeshi Sowa
- 申请人地址： JP Tokyo
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： DLA Piper LLP (US)
- 优先权： JP2008-014497 20080125; JP2008-304814 20081128
- 主分类号： G02B27/10
- IPC分类号： G02B27/10 ; B41J15/14
摘要：
An exposure head, includes: a lens array that includes lenses that are arranged in a first direction and in a second direction orthogonal to the first direction; and a light emitting element substrate that is provided with light emitting elements that emit lights to be imaged by the lenses, wherein a relationship defined by a following formula: 1