发明授权
- 专利标题: Compressive nitride film and method of manufacturing thereof
- 专利标题(中): 压缩性氮化物膜及其制造方法
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申请号: US12364088申请日: 2009-02-02
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公开(公告)号: US07851376B2公开(公告)日: 2010-12-14
- 发明人: Daewon Yang , Woo-Hyeong Lee , Tai-chi Su , Yun-Yu Wang
- 申请人: Daewon Yang , Woo-Hyeong Lee , Tai-chi Su , Yun-Yu Wang
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理商 Yuanmin Cai
- 主分类号: H01L21/31
- IPC分类号: H01L21/31 ; H01L21/469
摘要:
Embodiments of the invention provide a method of forming a compressive stress nitride film overlying a plurality of p-type field effect transistor gate structures produced on a substrate through a high-density plasma deposition process. Embodiments include generating an environment filled with high-density plasma using source gases of at least silane, argon and nitrogen; biasing the substrate to a high frequency power of varying density, in a range between 0.8 W/cm2 and 5.0 W/cm2; and depositing the high-density plasma to the plurality of gate structures to form the compressive stress nitride film.