发明授权
US07851787B2 Organic thin film transistor with tunneling barrier layer and method of manufacturing the same 有权
具有隧道势垒层的有机薄膜晶体管及其制造方法

  • 专利标题: Organic thin film transistor with tunneling barrier layer and method of manufacturing the same
  • 专利标题(中): 具有隧道势垒层的有机薄膜晶体管及其制造方法
  • 申请号: US11645733
    申请日: 2006-12-27
  • 公开(公告)号: US07851787B2
    公开(公告)日: 2010-12-14
  • 发明人: Chang Wook Han
  • 申请人: Chang Wook Han
  • 申请人地址: KR Seoul
  • 专利权人: LG Display Co., Ltd.
  • 当前专利权人: LG Display Co., Ltd.
  • 当前专利权人地址: KR Seoul
  • 代理机构: Morgan, Lewis & Bockius LLP
  • 优先权: KR10-2005-0134409 20051229
  • 主分类号: H01L35/24
  • IPC分类号: H01L35/24 H01L51/00
Organic thin film transistor with tunneling barrier layer and method of manufacturing the same
摘要:
The present application relates to an organic thin film transistor with tunneling barrier layer and method of manufacturing the same improving the mobility properties of the thin film transistor and preventing the current crowding at low voltages. The organic thin film transistor includes a buffer layer on a substrate, a source and drain electrodes on the buffer layer, wherein each of the source and drain electrodes is in an island shape, a tunneling barrier layer on the source and drain electrodes, an organic semiconductor layer on the tunneling barrier layer, a gate insulation layer on the organic semiconductor layer, and a gate electrode overlapping both edges of the source and drain electrodes, and formed on the gate insulation layer, and wherein the tunneling barrier layer under the organic semiconductor layer is formed between the source and drain electrodes and the gate electrode.
信息查询
0/0