发明授权
- 专利标题: Field-effect transistor
- 专利标题(中): 场效应晶体管
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申请号: US12089907申请日: 2006-11-01
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公开(公告)号: US07851792B2公开(公告)日: 2010-12-14
- 发明人: Toshiaki Aiba , Masafumi Sano , Nobuyuki Kaji
- 申请人: Toshiaki Aiba , Masafumi Sano , Nobuyuki Kaji
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2005-323689 20051108; JP2006-283893 20061018
- 国际申请: PCT/JP2006/322327 WO 20061101
- 国际公布: WO2007/055256 WO 20070518
- 主分类号: H01L29/786
- IPC分类号: H01L29/786
摘要:
Provided is a field-effect transistor including an active layer and a gate insulating film, wherein the active layer includes an amorphous oxide layer containing an amorphous region and a crystalline region, and the crystalline region is in the vicinity of or in contact with an interface between the amorphous oxide layer and the gate insulating film.
公开/授权文献
- US20090272970A1 FIELD-EFFECT TRANSISTOR 公开/授权日:2009-11-05
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