Invention Grant
- Patent Title: Pixel structure
- Patent Title (中): 像素结构
-
Application No.: US12725458Application Date: 2010-03-17
-
Publication No.: US07855382B2Publication Date: 2010-12-21
- Inventor: Hsiang-Lin Lin , Chun-Chieh Tsao
- Applicant: Hsiang-Lin Lin , Chun-Chieh Tsao
- Applicant Address: TW Hsinchu
- Assignee: Au Optronics Corporation
- Current Assignee: Au Optronics Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW96150582A 20071227
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L31/036 ; H01L31/0376 ; H01L31/20

Abstract:
A pixel structure including a gate, a gate dielectric layer, a patterned semiconductor layer having a channel area disposed above the gate, a patterned dielectric layer having an etching-stop layer disposed above the gate and a number of bumps, a patterned metal layer having a reflective pixel electrode, a source and a drain, an overcoat dielectric layer, and a transparent pixel electrode sequentially disposed on a substrate is provided. The source and the drain respectively cover portions of the channel area. The reflective pixel electrode connects the drain and covers the bumps to form an uneven surface. The overcoat dielectric layer disposed on a transistor constituted by the gate, the gate dielectric layer, the patterned semiconductor layer, the source and the drain has a contact opening exposing a portion of the reflective pixel electrode. The transparent pixel electrode is electrically connected to the reflective pixel electrode through the contact opening.
Public/Granted literature
- US20100187531A1 PIXEL STRUCTURE Public/Granted day:2010-07-29
Information query
IPC分类: