发明授权
- 专利标题： Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
- 专利标题（中）： 用于抑制使用光刻系统打印的特征的波纹的装置，方法和程序产品
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申请号： US11092983申请日： 2005-03-30
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公开(公告)号： US07856606B2公开(公告)日： 2010-12-21
- 发明人: Markus Franciscus Antonius Eurlings , Melchior Mulder , Thomas Laidig , Uwe Hollerbach
- 申请人： Markus Franciscus Antonius Eurlings , Melchior Mulder , Thomas Laidig , Uwe Hollerbach
- 申请人地址： NL Veldhoven
- 专利权人： ASML MaskTools B.V.
- 当前专利权人： ASML MaskTools B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A method for minimizing rippling of features when imaged on a surface of a substrate using a mask. The method includes the steps of determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design; determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and modifying the design at each section by the amount determined in the previous step.
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