发明授权
- 专利标题: Heterocycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as N-type semiconductor materials for thin film transistors
- 专利标题(中): 杂环烷基取代的萘基四羧酸二酰亚胺化合物作为薄膜晶体管的N型半导体材料
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申请号: US11771196申请日: 2007-06-29
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公开(公告)号: US07858970B2公开(公告)日: 2010-12-28
- 发明人: Deepak Shukla , Thomas R. Welter , Wendy G. Ahearn
- 申请人: Deepak Shukla , Thomas R. Welter , Wendy G. Ahearn
- 申请人地址: US NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: US NY Rochester
- 代理商 J. Lanny Tucker; Chris P. Konkol
- 主分类号: H01L35/24
- IPC分类号: H01L35/24 ; H01L51/00
摘要:
A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to one or both of the imide nitrogen atoms, a substituted or unsubstituted heterocycloalkyl ring system. Such transistors can further comprise spaced apart first and second contacts or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 200° C.
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