Invention Grant
- Patent Title: Heterocycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as N-type semiconductor materials for thin film transistors
- Patent Title (中): 杂环烷基取代的萘基四羧酸二酰亚胺化合物作为薄膜晶体管的N型半导体材料
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Application No.: US11771196Application Date: 2007-06-29
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Publication No.: US07858970B2Publication Date: 2010-12-28
- Inventor: Deepak Shukla , Thomas R. Welter , Wendy G. Ahearn
- Applicant: Deepak Shukla , Thomas R. Welter , Wendy G. Ahearn
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent J. Lanny Tucker; Chris P. Konkol
- Main IPC: H01L35/24
- IPC: H01L35/24 ; H01L51/00

Abstract:
A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to one or both of the imide nitrogen atoms, a substituted or unsubstituted heterocycloalkyl ring system. Such transistors can further comprise spaced apart first and second contacts or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 200° C.
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