发明授权
- 专利标题: Field-effect semiconductor device
- 专利标题(中): 场效应半导体器件
-
申请号: US12199323申请日: 2008-08-27
-
公开(公告)号: US07859021B2公开(公告)日: 2010-12-28
- 发明人: Nobuo Kaneko
- 申请人: Nobuo Kaneko
- 申请人地址: JP
- 专利权人: Sanken Electric Co., Ltd.
- 当前专利权人: Sanken Electric Co., Ltd.
- 当前专利权人地址: JP
- 代理机构: Woodcock Washburn LLP
- 优先权: JP2007-222273 20070829; JP2008-073603 20080321
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
A HEMT-type field-effect semiconductor device has a main semiconductor region comprising two layers of dissimilar materials such that a two-dimensional electron gas layer is generated along the heterojunction between the two layers. A source and a drain electrode are placed in spaced positions on a major surface of the main semiconductor region. Between these electrodes, a gate electrode is received in a recess in the major surface of the main semiconductor region via a p-type metal oxide semiconductor film whereby a depletion zone is normally created in the electron gas layer, with a minimum of turn-on resistance and gate leak current.
公开/授权文献
信息查询
IPC分类: