发明授权
- 专利标题: Microlithographic reduction projection catadioptric objective
- 专利标题(中): 微光刻折射反射折射目标
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申请号: US11686157申请日: 2007-03-14
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公开(公告)号: US07859748B2公开(公告)日: 2010-12-28
- 发明人: David R. Shafer , Russell Hudyma , Wilhelm Ulrich
- 申请人: David R. Shafer , Russell Hudyma , Wilhelm Ulrich
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT GmbH
- 当前专利权人: Carl Zeiss SMT GmbH
- 当前专利权人地址: DE Oberkochen
- 代理机构: Fish & Richardson P.C.
- 主分类号: G02B17/08
- IPC分类号: G02B17/08
摘要:
A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.
公开/授权文献
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |
G02B17/08 | .折反射系统 |