发明授权
- 专利标题： Binary sinusoidal sub-wavelength gratings as alignment marks
- 专利标题（中）： 二进正弦亚波长光栅作为对准标记
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申请号： US11284407申请日： 2005-11-22
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公开(公告)号： US07863763B2公开(公告)日： 2011-01-04
- 发明人: Richard Johannes Franciscus Van Haren , Sami Musa
- 申请人： Richard Johannes Franciscus Van Haren , Sami Musa
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： H01L23/544
- IPC分类号： H01L23/544
摘要：
The present invention relates to alignment marks for use on substrates, the alignment marks consisting of periodic 2-dimensional arrays of structures, the spacing of the structures being smaller than an alignment beam but larger than an exposure beam and the width of the structures varying sinusoidally from one end of an array to the other.
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