发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 光刻设备和器件制造方法
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申请号： US11404091申请日： 2006-04-14
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公开(公告)号： US07864292B2公开(公告)日： 2011-01-04
- 发明人: Martinus Hendrikus Antonius Leenders , Nicolaas Rudolf Kemper , Joost Jeroen Ottens
- 申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Rudolf Kemper , Joost Jeroen Ottens
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
公开/授权文献
- US20070109513A1 Lithographic apparatus and device manufacturing method 公开/授权日：2007-05-17
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