发明授权
- 专利标题： Method and system for measuring patterned structures
- 专利标题（中）： 用于测量图案结构的方法和系统
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申请号： US12624555申请日： 2009-11-24
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公开(公告)号： US07864343B2公开(公告)日： 2011-01-04
- 发明人: Moshe Finarov , Boaz Brill
- 申请人： Moshe Finarov , Boaz Brill
- 申请人地址： IL Rehovot
- 专利权人： Nova Measuring Instruments Ltd.
- 当前专利权人： Nova Measuring Instruments Ltd.
- 当前专利权人地址： IL Rehovot
- 代理机构： Browdy and Neimark, PLLC
- 优先权： IL130874 19990709
- 主分类号： G01B11/14
- IPC分类号： G01B11/14
摘要：
A method of preparation of reference data for measuring the profile of a patterned structure for use in control of a manufacturing process, the method including: providing a model for generating profiles based on the manufacturing process; generating the profiles by simulation of the manufacturing process; and preparing diffraction signal reference data corresponding to the generated profiles.
公开/授权文献
- US20100121627A1 METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURES 公开/授权日：2010-05-13
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