- 专利标题: Split gate non-volatile flash memory cell having a floating gate, control gate, select gate and an erase gate with an overhang over the floating gate, array and method of manufacturing
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申请号: US12618632申请日: 2009-11-13
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公开(公告)号: US07868375B2公开(公告)日: 2011-01-11
- 发明人: Xian Liu , Amitay Levi , Alexander Kotov , Yuri Tkachev , Viktor Markov , James Yingbo Jia , Chien Sheng Su , Yaw Wen Hu
- 申请人: Xian Liu , Amitay Levi , Alexander Kotov , Yuri Tkachev , Viktor Markov , James Yingbo Jia , Chien Sheng Su , Yaw Wen Hu
- 申请人地址: US CA Sunnyvale
- 专利权人: Silicon Storage Technology, Inc.
- 当前专利权人: Silicon Storage Technology, Inc.
- 当前专利权人地址: US CA Sunnyvale
- 代理机构: DLA Piper LLP (US)
- 主分类号: H01L29/788
- IPC分类号: H01L29/788
摘要:
An improved split gate non-volatile memory cell is made in a substantially single crystalline substrate of a first conductivity type, having a first region of a second conductivity type, a second region of the second conductivity type, with a channel region between the first region and the second region in the substrate. The cell has a select gate above a portion of the channel region, a floating gate over another portion of the channel region, a control gate above the floating gate and an erase gate adjacent to the floating gate. The erase gate has an overhang extending over the floating gate. The ratio of the dimension of the overhang to the dimension of the vertical separation between the floating gate and the erase gate is between approximately 1.0 and 2.5, which improves erase efficiency.
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