发明授权
- 专利标题: Multilayer substrate and manufacturing method thereof
- 专利标题(中): 多层基板及其制造方法
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申请号: US11229394申请日: 2005-09-15
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公开(公告)号: US07868464B2公开(公告)日: 2011-01-11
- 发明人: Kenichi Kawabata , Hisayuki Abe , Masashi Katsumata
- 申请人: Kenichi Kawabata , Hisayuki Abe , Masashi Katsumata
- 申请人地址: JP Tokyo
- 专利权人: TDK Corporation
- 当前专利权人: TDK Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Wolff Law Offices, PLLC
- 代理商 Kevin Alan Wolff
- 优先权: JP2004-269706 20040916; JP2004-269707 20040916; JP2004-269708 20040916
- 主分类号: H01L23/485
- IPC分类号: H01L23/485
摘要:
A multilayer substrate according to the present invention includes a plurality of laminated insulating layers and conductive patterns formed between the respective insulating layers. The conductive patterns include a first conductive pattern having a predetermined thickness and a second conductive pattern thicker than the first conductive pattern. The first and second conductive patterns are located in the same layer. The first conductive pattern is formed by pattern-etching a conductive layer having a uniform thickness by the subtractive method. The second conductive pattern is formed by forming a pattern-forming groove and then filling the inside of the pattern-forming groove with a conductive material simultaneously with forming a via hole. The first conductive pattern is suitable for an LC pattern for a high-frequency circuit requiring small variations in the width and the thickness of the pattern as well as accuracy in the thickness relative to an insulating pattern, and for a normal conductive pattern requiring impedance matching. The second conductive pattern is suitable for an L pattern for a choke coil.
公开/授权文献
- US20060057341A1 Multilayer substrate and manufacturing method thereof 公开/授权日:2006-03-16
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