Invention Grant
US07875482B2 Substrate with multiple encapsulated pressures 有权
具有多重封装压力的基材

Substrate with multiple encapsulated pressures
Abstract:
A method of forming a device with multiple encapsulated pressures is disclosed herein. In accordance with one embodiment of the present invention, there is provided a method of forming a device with multiple encapsulated pressures, including providing a substrate, forming a functional layer on top of a surface of the substrate, the functional layer including a first device portion at a first location, and a second device portion at a second location adjacent to the first location, encapsulating the functional layer, forming at least one diffusion resistant layer above the encapsulated functional layer at a location above the first location and not above the second location, modifying an environment adjacent the at least one diffusion resistant layer, and diffusing a gas into the second location as a result of the modified environment.
Public/Granted literature
Information query
Patent Agency Ranking
0/0