Invention Grant
US07876180B2 Waveguide forming apparatus, dielectric waveguide forming apparatus, pin structure, and high frequency circuit 有权
波导形成装置,介质波导形成装置,引脚结构和高频电路

  • Patent Title: Waveguide forming apparatus, dielectric waveguide forming apparatus, pin structure, and high frequency circuit
  • Patent Title (中): 波导形成装置,介质波导形成装置,引脚结构和高频电路
  • Application No.: US12282321
    Application Date: 2007-03-08
  • Publication No.: US07876180B2
    Publication Date: 2011-01-25
  • Inventor: Hiroshi Uchimura
  • Applicant: Hiroshi Uchimura
  • Applicant Address: JP Kyoto
  • Assignee: Kyocera Corporation
  • Current Assignee: Kyocera Corporation
  • Current Assignee Address: JP Kyoto
  • Agency: DLA Piper LLP (US)
  • Priority: JP2006-064482 20060309; JP2006-096034 20060330; JP2006-209312 20060731
  • International Application: PCT/JP2007/054593 WO 20070308
  • International Announcement: WO2007/102591 WO 20070913
  • Main IPC: H01P3/16
  • IPC: H01P3/16 H01P5/04
Waveguide forming apparatus, dielectric waveguide forming apparatus, pin structure, and high frequency circuit
Abstract:
There are provided a waveguide forming apparatus, a dielectric waveguide forming apparatus, a pin structure and a high frequency circuit that can optimize a circuit portion provided therein and have high versatility. A waveguide is formed by allowing first and second conductive layers (6, 7) to cooperate with a plurality of control pins (2). A variable high frequency circuit forming portion is freely and simply changed by displacing each control pin (2) between a down-status indicated by Z1 and an up-status indicated by Z2.
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