发明授权
- 专利标题: Shield fabrication of magnetic write heads
- 专利标题(中): 磁写头的屏蔽制造
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申请号: US11767330申请日: 2007-06-22
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公开(公告)号: US07877859B2公开(公告)日: 2011-02-01
- 发明人: Wen-Chien Hsiao , Yimin Hsu , Vladimir Nikitin
- 申请人: Wen-Chien Hsiao , Yimin Hsu , Vladimir Nikitin
- 申请人地址: NL Amsterdam
- 专利权人: Hitachi Global Storage Technologies Netherlands, B.V.
- 当前专利权人: Hitachi Global Storage Technologies Netherlands, B.V.
- 当前专利权人地址: NL Amsterdam
- 代理机构: Duft Bornsen & Fishman, LLP
- 主分类号: G11B5/127
- IPC分类号: G11B5/127 ; H04R31/00
摘要:
Methods are provided for fabricating a write head with a self aligned wrap around shield and a self aligned flared region of a write pole. A flare point and a track width of a write pole may be fabricated using multiple processes. The multiple processes utilize several masking structures to define the track width and the flare point of the write pole. A mask structure is formed to cover a first portion of the write pole. An edge of the mask structure adjacent to an exposed second portion of the write pole defines a flare point of the write pole. Various structures of the write head, including shield gap layers, a wrap around shield and a flared region (e.g., the yoke) of the write pole may be fabricated from the flare point defined by the mask structure.
公开/授权文献
- US20080313885A1 SHIELD FABRICATION OF MAGNETIC WRITE HEADS 公开/授权日:2008-12-25
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