Invention Grant
- Patent Title: Structure having nanoapertures
- Patent Title (中): 具有纳米孔径的结构
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Application No.: US11789821Application Date: 2007-04-26
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Publication No.: US07880251B2Publication Date: 2011-02-01
- Inventor: Shih-Yuan Wang , Alexandre M. Bratkovski
- Applicant: Shih-Yuan Wang , Alexandre M. Bratkovski
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: H01L27/14
- IPC: H01L27/14 ; H01L31/00
Abstract:
A structure includes a film having a plurality of nanoapertures. The nanoapertures are configured to allow the transmission of a predetermined subwavelength of light through the film via the plurality of nanoapertures. The structure also includes a semiconductor layer in connection with the film to facilitate the detection of the predetermined subwavelength of light transmitted through the film.
Public/Granted literature
- US20090015838A1 Structure having nanoapertures Public/Granted day:2009-01-15
Information query
IPC分类:
