Invention Grant
US07881350B2 Laser apparatus, laser irradiation method, and manufacturing method of semiconductor device 有权
激光装置,激光照射方法以及半导体装置的制造方法

Laser apparatus, laser irradiation method, and manufacturing method of semiconductor device
Abstract:
It is an object to provide a laser apparatus, a laser irradiating method and a manufacturing method of a semiconductor device that can perform uniform a process with a laser beam to an object uniformly. The present invention provides a laser apparatus comprising an optical system for sampling a part of a laser beam emitted from an oscillator, a sensor for generating an electric signal including fluctuation in energy of the laser beam as a data from the part of the laser beam, a means for performing signal processing to the electrical signal to grasp a state of the fluctuation in energy of the laser beam, and controlling a relative speed of an beam spot of the laser beam to an object in order to change in phase with the fluctuation in energy of the laser beam.
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