Invention Grant
- Patent Title: Semiconductor laser apparatus and method of manufacturing the same
- Patent Title (中): 半导体激光装置及其制造方法
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Application No.: US12333764Application Date: 2008-12-12
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Publication No.: US07881356B2Publication Date: 2011-02-01
- Inventor: Yasuyuki Bessho , Masayuki Hata , Daijiro Inoue
- Applicant: Yasuyuki Bessho , Masayuki Hata , Daijiro Inoue
- Applicant Address: JP Osaka
- Assignee: Sanyo Electric Co., Ltd.
- Current Assignee: Sanyo Electric Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2004-101488 20040330; JP2004-184316 20040622; JP2004-289087 20040930; JP2005-077910 20050317
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
Second and third p-side pad electrodes are formed on an insulating film of a blue-violet semiconductor laser device on both sides of a first p-side pad electrode. The second p-side pad electrode and the third p-side pad electrode are formed separately from each other. Solder films are formed on the upper surfaces of the second and third p-side pad electrodes respectively. A fourth p-side pad electrode of a red semiconductor laser device is bonded onto the second p-side pad electrode with the corresponding solder film sandwiched therebetween. A fifth p-side pad electrode of an infrared semiconductor laser device is bonded onto the third p-side pad electrode with the corresponding solder film sandwiched therebetween. The second and third p-side pad electrodes are formed separately from each other, so that the fourth and fifth p-side pad electrodes are electrically isolated from each other.
Public/Granted literature
- US20090097523A1 SEMICONDUCTOR LASER APPARATUS AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-04-16
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