发明授权
- 专利标题: Transparent electrically conductive film and process for producing the same
- 专利标题(中): 透明导电膜及其制造方法
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申请号: US11918700申请日: 2006-04-18
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公开(公告)号: US07883837B2公开(公告)日: 2011-02-08
- 发明人: Kohei Yamada , Hidekazu Shiomi , Hideyuki Yamada
- 申请人: Kohei Yamada , Hidekazu Shiomi , Hideyuki Yamada
- 申请人地址: JP Fukui-Shi, Fukui
- 专利权人: Seiren Co., Ltd.
- 当前专利权人: Seiren Co., Ltd.
- 当前专利权人地址: JP Fukui-Shi, Fukui
- 代理机构: Dilworth & Barrese, LLP.
- 优先权: JP2005-119492 20050418
- 国际申请: PCT/JP2006/308504 WO 20060418
- 国际公布: WO2006/112535 WO 20061026
- 主分类号: G03F1/00
- IPC分类号: G03F1/00 ; H01L21/00
摘要:
This invention provides a transparent electrically conductive film, which, while maintaining the light transparency of a transparent film, has excellent electrical conductivity, can be utilized for electromagnetic wave shielding, and does not cause inclusion of air bubbles in the lamination onto other base material, and a process for producing the same. The production process comprises the steps of forming a large number of concaves and convexes having an average height of not more than 0.1 μm on both sides or one side of a transparent film, forming a resist layer having a pattern shape opposite to the electrically conductive part in the electrically conductive film on the transparent film on its concave-convex side, applying a catalyst for plating onto the resist layer-formed face, separating the resist layer, forming a metal layer by plating, and blackening the metal layer, the metal layer satisfying 1≦W/T≦500 wherein W represents the width of the metal layer and T represents the height of the metal layer.