发明授权
- 专利标题: Method of patterning nano conductive film
- 专利标题(中): 纳米导电膜图案方法
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申请号: US11394085申请日: 2006-03-31
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公开(公告)号: US07884356B2公开(公告)日: 2011-02-08
- 发明人: Jong-Jin Park , Myeong-Suk Kim , Tae-Yong Noh , Sung-Hun Lee , Sang-Yoon Lee , Eun-Jeong Jeong
- 申请人: Jong-Jin Park , Myeong-Suk Kim , Tae-Yong Noh , Sung-Hun Lee , Sang-Yoon Lee , Eun-Jeong Jeong
- 申请人地址: KR Giheung-Gu, Yongin, Gyunggi-Do
- 专利权人: Samsung Mobile Display Co., Ltd.
- 当前专利权人: Samsung Mobile Display Co., Ltd.
- 当前专利权人地址: KR Giheung-Gu, Yongin, Gyunggi-Do
- 代理商 Robert E. Bushnell, Esq.
- 优先权: KR10-2005-0052721 20050618
- 主分类号: H01L35/24
- IPC分类号: H01L35/24 ; H01L51/00
摘要:
A donor substrate for forming a nano conductive film includes a base substrate and a transferring layer that is disposed on the base substrate. The transferring layer includes nano conductive particles and an organic semiconductor. A method of patterning a nano conductive film is provided, wherein a donor substrate in which nano conductive particles are dispersed by employing an organic semiconductor having low molecular weight as a binder is prepared, and nano conductive particles are patterned on a receptor substrate by employing the donor substrate. The method can be used to prepare patterns of various devices including a display device such as an OLED and an OTFT. Such a device can be prepared simply and economically by preparing a device comprising nano conductive particles and an organic semiconductor in wet basis even without deposition.
公开/授权文献
- US20060284169A1 Method of patterning nano conductive film 公开/授权日:2006-12-21
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