Invention Grant
- Patent Title: Plasma processing apparatus
- Patent Title (中): 等离子体处理装置
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Application No.: US11313022Application Date: 2005-12-20
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Publication No.: US07886687B2Publication Date: 2011-02-15
- Inventor: Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Young-Joo Hwang , Jong-Cheon Kim
- Applicant: Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Young-Joo Hwang , Jong-Cheon Kim
- Applicant Address: KR Sungnam-shi
- Assignee: Advanced Display Process Engineering Co. Ltd.
- Current Assignee: Advanced Display Process Engineering Co. Ltd.
- Current Assignee Address: KR Sungnam-shi
- Agency: KED & Assoicates, LLP
- Priority: KR10-2004-0110832 20041223; KR10-2004-0110937 20041223; KR10-2004-0111019 20041223
- Main IPC: C23C16/50
- IPC: C23C16/50 ; C23C16/503 ; C23C16/505 ; C23C16/509 ; C23F1/00 ; H01L21/306 ; C23C16/06 ; C23C16/22
Abstract:
A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.
Public/Granted literature
- US20060137820A1 Plasma processing apparatus Public/Granted day:2006-06-29
Information query
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