Invention Grant
- Patent Title: Process for producing electronic circuit
- Patent Title (中): 电子电路生产工艺
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Application No.: US11497045Application Date: 2006-08-01
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Publication No.: US07887688B2Publication Date: 2011-02-15
- Inventor: Isao Takasu
- Applicant: Isao Takasu
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Turocy & Watson, LLP
- Priority: JP2005-223900 20050802
- Main IPC: C25D13/12
- IPC: C25D13/12 ; C25D13/16

Abstract:
Disclosed is a production process of an electronic circuit that can efficiently form a highly accurate electrically conductive pattern. The production process comprises the steps of: adhering insulating particles onto an electrically conductive base material to form an insulating pattern comprising a pattern region and a nonpattern region on the electrically conductive base material; adhering electrically conductive particles to the nonpattern region by first electrophoretic treatment; removing the pattern region by second electrophoretic treatment; and transferring the electrically conductive particles onto a recording medium to form an electrically conductive pattern of the electrically conductive particles onto the recording medium.
Public/Granted literature
- US20070181429A1 Process for producing electronic circuit Public/Granted day:2007-08-09
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