发明授权
- 专利标题: Method of enabling selective area plating on a substrate
- 专利标题(中): 在基板上进行选择性区域电镀的方法
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申请号: US12315066申请日: 2008-11-25
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公开(公告)号: US07891091B2公开(公告)日: 2011-02-22
- 发明人: Yonggang Li , Islam Salama
- 申请人: Yonggang Li , Islam Salama
- 主分类号: H01K3/10
- IPC分类号: H01K3/10
摘要:
A method of enabling selective area plating on a substrate (201) includes forming a first electrically conductive layer (310) on the substrate, covering the electrically conductive layer with an anti-electroless plating layer (410), patterning the substrate in order to form therein a feature (510, 520) extending through the anti-electroless plating layer and the first electrically conductive layer, forming a second electrically conductive layer (610) adjoining and electrically connected to the first electrically conductive layer, forming a third electrically conductive layer (710) over the second electrically conductive layer, and removing the anti-electroless plating layer and the first electrically conductive layer.
公开/授权文献
- US20100126009A1 Method of enabling selective area plating on a substrate 公开/授权日:2010-05-27
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