发明授权
US07891091B2 Method of enabling selective area plating on a substrate 有权
在基板上进行选择性区域电镀的方法

  • 专利标题: Method of enabling selective area plating on a substrate
  • 专利标题(中): 在基板上进行选择性区域电镀的方法
  • 申请号: US12315066
    申请日: 2008-11-25
  • 公开(公告)号: US07891091B2
    公开(公告)日: 2011-02-22
  • 发明人: Yonggang LiIslam Salama
  • 申请人: Yonggang LiIslam Salama
  • 主分类号: H01K3/10
  • IPC分类号: H01K3/10
Method of enabling selective area plating on a substrate
摘要:
A method of enabling selective area plating on a substrate (201) includes forming a first electrically conductive layer (310) on the substrate, covering the electrically conductive layer with an anti-electroless plating layer (410), patterning the substrate in order to form therein a feature (510, 520) extending through the anti-electroless plating layer and the first electrically conductive layer, forming a second electrically conductive layer (610) adjoining and electrically connected to the first electrically conductive layer, forming a third electrically conductive layer (710) over the second electrically conductive layer, and removing the anti-electroless plating layer and the first electrically conductive layer.
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