发明授权
- 专利标题: Sequential UV induced chemical vapor deposition
- 专利标题(中): 顺序UV诱导化学气相沉积
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申请号: US10465721申请日: 2003-06-18
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公开(公告)号: US07897215B1公开(公告)日: 2011-03-01
- 发明人: James A. Fair , Nerissa Taylor
- 申请人: James A. Fair , Nerissa Taylor
- 申请人地址: US CA San Jose
- 专利权人: Novellus Systems, Inc.
- 当前专利权人: Novellus Systems, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Weaver Austin Villeneuve & Sampson LLP
- 主分类号: B05D3/06
- IPC分类号: B05D3/06
摘要:
Ion-induced, UV-induced, and electron-induced sequential chemical vapor deposition (CVD) processes are disclosed where an ion flux, a flux of ultra-violet radiation, or an electron flux, respectively, is used to induce the chemical reaction in the process. The process for depositing a thin film on a substrate includes introducing a flow of a first reactant gas in vapor phase into a process chamber where the gas forms an adsorbed saturated layer on the substrate and exposing the substrate to a flux of ions, a flux of ultra-violet radiation, or a flux of electrons for inducing a chemical reaction of the adsorbed layer of the first reactant gas to form the thin film. A second reactant gas can be used to form a compound thin film. The ion-induced, UV-induced, and electron-induced sequential CVD process of the present invention can be repeated to form a thin film of the desired thickness.