Invention Grant
US07904871B2 Computer-implemented method of optimizing refraction and TIR structures to enhance path lengths in PV devices
有权
计算机实现的优化折射和TIR结构的方法,以增强光伏设备的路径长度
- Patent Title: Computer-implemented method of optimizing refraction and TIR structures to enhance path lengths in PV devices
- Patent Title (中): 计算机实现的优化折射和TIR结构的方法,以增强光伏设备的路径长度
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Application No.: US12407602Application Date: 2009-03-19
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Publication No.: US07904871B2Publication Date: 2011-03-08
- Inventor: Mark A. Raymond , Howard G. Lange , Seth Weiss
- Applicant: Mark A. Raymond , Howard G. Lange , Seth Weiss
- Applicant Address: US CO Englewood
- Assignee: Genie Lens Technologies, LLC
- Current Assignee: Genie Lens Technologies, LLC
- Current Assignee Address: US CO Englewood
- Agency: Marsh Fischmann & Breyfogle, LLP
- Agent Kent A. Lembke
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A computer-implemented method is provided for optimizing configuration of absorption enhancement structures for use in a photovoltaic enhancement film that is applied onto a PV device to improve absorption. The method includes receiving optimization run input defining a PV enhancement film including defining absorption enhancement structures with differing configurations. The method includes modeling a PV device including PV material such as a silicon thin film. A first ray tracing is performed over a range of incidence angles for the PV device. The method includes determining a set of base path angles for the PV material layer based on this first ray tracing. A second ray tracing is performed for the PV device with the enhancement film, which has absorption enhancement structures. Enhanced path lengths are determined based on the second ray tracking, and path length ratios are determined by comparing the enhanced path lengths to the base path lengths.
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