发明授权
- 专利标题: Imprint lithography
- 专利标题(中): 印刷光刻
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申请号: US12404783申请日: 2009-03-16
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公开(公告)号: US07906059B2公开(公告)日: 2011-03-15
- 发明人: Erik Roelof Loopstra , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
- 申请人: Erik Roelof Loopstra , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: B28B1/14
- IPC分类号: B28B1/14 ; B28B3/00 ; B28B3/02 ; B28B19/00 ; B29C39/00 ; B29C41/00 ; B29C41/46 ; B29C43/02 ; B29C43/32 ; B29C51/00 ; B29C53/00 ; B27N3/18 ; B27N3/08
摘要:
An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.
公开/授权文献
- US20090174115A1 IMPRINT LITHOGRAPHY 公开/授权日:2009-07-09
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