发明授权
- 专利标题: Measurement system for correcting overlay measurement error
- 专利标题(中): 用于校正覆盖测量误差的测量系统
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申请号: US12039479申请日: 2008-02-28
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公开(公告)号: US07908105B2公开(公告)日: 2011-03-15
- 发明人: Moon-Sang Lee , Bong-Jin Yum , Hong-Seok Kim , Kwan-Woo Kim , Seung-Hyun Kim , Chan-Hoon Park
- 申请人: Moon-Sang Lee , Bong-Jin Yum , Hong-Seok Kim , Kwan-Woo Kim , Seung-Hyun Kim , Chan-Hoon Park
- 申请人地址: KR Yeongtong-gu, Suwon-si, Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Yeongtong-gu, Suwon-si, Gyeonggi-do
- 代理机构: Muir Patent Consulting, PLLC
- 优先权: KR10-2007-0025142 20070314
- 主分类号: G06F11/00
- IPC分类号: G06F11/00
摘要:
A measurement system and a measurement method, which can obtain a measurement value close to a true value considering an overlay measurement error according to a higher order regression analysis model, is disclosed. The measurement system and the measurement method provide a technique for determining optimal positions of shots to be measured using an optimal experimental design. When the regression analysis model and the number of shots to be measured are determined in advance, a method is used for determining an optimal number of shots to be measured according to the regression analysis model and process dispersion using a confidence interval estimating method.
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