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发明授权
US07910267B1 Method and system for providing optical proximity correction for structures such as a PMR nose 有权
用于为诸如PMR鼻子的结构提供光学邻近校正的方法和系统

Method and system for providing optical proximity correction for structures such as a PMR nose
摘要：
An optical mask for providing a pattern for portion of an electronic device, such as a magnetic recording transducer, is disclosed. The optical mask includes a device feature and at least one detached correction feature. The device feature includes a corner corresponding to a device corner of the pattern. The device corner has an angle of greater than zero degrees and less than one hundred eighty degrees. The at least one detached correction feature resides in proximity to but is physically separated from the corner. Each of the at least one detached correction feature is sub-resolution.
摘要（中）：

公开了一种用于为诸如磁记录换能器的电子设备的一部分提供图案的光掩模。 光学掩模包括设备特征和至少一个分离的校正特征。 设备特征包括与图案的设备角对应的角。 设备角具有大于零度且小于百八十度的角度。 至少一个分离的校正特征位于附近，但是与角部物理分离。 至少一个分离的校正特征中的每一个都是子分辨率。

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