发明授权
- 专利标题： Exposure head, a method of controlling an exposure head and an image forming apparatus
- 专利标题（中）： 曝光头，控制曝光头的方法和图像形成装置
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申请号： US12334312申请日： 2008-12-12
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公开(公告)号： US07916163B2公开(公告)日： 2011-03-29
- 发明人: Ryuta Koizumi , Nozomu Inoue , Yujiro Nomura
- 申请人： Ryuta Koizumi , Nozomu Inoue , Yujiro Nomura
- 申请人地址： JP Tokyo
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： DLA Piper LLP (US)
- 优先权： JP2007-323664 20071214; JP2008-259370 20081006
- 主分类号： B41J2/45
- IPC分类号： B41J2/45
摘要：
An exposure head, includes: an imaging optical system; a first light emitting element that emits a light which is to be focused by the imaging optical system; a second light emitting element that emits a light which is to be focused by the imaging optical system; a first TFT circuit that is connected with the first light emitting element via an interconnection wire; and a second TFT circuit that is connected with the second light emitting element via an interconnection wire, wherein the first light emitting element and the second light emitting element are provided between the first TFT circuit and the second TFT circuit.