Invention Grant
- Patent Title: Method for manufacturing optical element
- Patent Title (中): 光学元件制造方法
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Application No.: US11866526Application Date: 2007-10-03
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Publication No.: US07916241B2Publication Date: 2011-03-29
- Inventor: Koji Mimura , Ken Sumiyoshi
- Applicant: Koji Mimura , Ken Sumiyoshi
- Applicant Address: JP Kanagawa
- Assignee: NEC LCD Technologies, Ltd.
- Current Assignee: NEC LCD Technologies, Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-280586 20061013; JP2007-215887 20070822
- Main IPC: G02F1/1335
- IPC: G02F1/1335 ; F21V11/16

Abstract:
An optical element manufacturing method according to the present invention includes: disposing a mask on a transparent photosensitive resin; patterning said transparent resin by applying an exposure light to said transparent photosensitive resin through said mask to form a transparent layer; forming a light absorbing layer by filling a gap in the transparent layer with a black curable resin; and illuminating a mask surface of the mask with the exposure light at an angle.
Public/Granted literature
- US20080089068A1 METHOD FOR MANUFACTURING OPTICAL ELEMENT Public/Granted day:2008-04-17
Information query
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