发明授权
- 专利标题: Processes and equipments for preparing F2-containing gases, as well as process and equipments for modifying the surfaces of articles
- 专利标题(中): 用于制备含F2气体的方法和设备,以及用于改变制品表面的工艺和设备
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申请号: US10585878申请日: 2005-03-30
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公开(公告)号: US07919141B2公开(公告)日: 2011-04-05
- 发明人: Takashi Tanioka , Katsuya Fukae , Taisuke Yonemura
- 申请人: Takashi Tanioka , Katsuya Fukae , Taisuke Yonemura
- 申请人地址: JP Tokyo
- 专利权人: Kanto Denka Kogyo Co., Ltd.
- 当前专利权人: Kanto Denka Kogyo Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Browdy and Neimark, PLLC
- 优先权: JP2004-103364 20040331
- 国际申请: PCT/JP2005/006149 WO 20050330
- 国际公布: WO2005/095268 WO 20051013
- 主分类号: C23C16/00
- IPC分类号: C23C16/00 ; H05H1/24 ; C01B7/00
摘要:
The present invention provides processes and equipments for safely and easily preparing an F2-containing gas, as well as processes and equipments for surface modification using the F2-containing gas prepared.According to the present invention, a gas containing a fluoro compound that is easier to handle than F2 is supplied and the fluoro compound is excited and decomposed to convert it into F2 gas before surface modification and then used for surface modification. According to the present invention, there is no necessity of providing, storing and transporting a large amount of F2 gas in advance because a necessary amount of F2 gas is obtained immediately before surface modification.A process for preparing an F2-containing gas comprises the steps of exciting at least one fluoro compound in a fluoro compound-containing gas by conferring energy on the fluoro compound-containing gas under reduced pressure; and partially or completely converting the excited fluoro compound-containing gas containing the excited fluoro compound into F2 under normal pressure or overpressure.
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