发明授权
- 专利标题: Magnetoresistive element and manufacturing method thereof
- 专利标题(中): 磁阻元件及其制造方法
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申请号: US12108093申请日: 2008-04-23
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公开(公告)号: US07919826B2公开(公告)日: 2011-04-05
- 发明人: Masayoshi Iwayama , Yoshiaki Asao , Takeshi Kajiyama , Keiji Hosotani
- 申请人: Masayoshi Iwayama , Yoshiaki Asao , Takeshi Kajiyama , Keiji Hosotani
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2007-114315 20070424; JP2008-106058 20080415
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A magnetoresistive element includes a first stacked structure formed by sequentially stacking a first fixed layer in which a magnetization direction is fixed and a first nonmagnetic layer, a second stacked structure formed on the first stacked structure by sequentially stacking a free layer in which a magnetization direction is changeable, a second nonmagnetic layer, and a second fixed layer in which a magnetization direction is fixed, and a circumferential wall formed in contact with a circumferential surface of the second stacked structure to surround the second stacked structure, and made of an insulator. A circumferential surface of the first stacked structure is substantially perpendicular. The second stacked structure has a tapered shape which narrows upward.
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