Invention Grant
US07919973B2 Method and apparatus for monitoring via's in a semiconductor fab
有权
用于在半导体晶圆厂中监测通孔的方法和装置
- Patent Title: Method and apparatus for monitoring via's in a semiconductor fab
- Patent Title (中): 用于在半导体晶圆厂中监测通孔的方法和装置
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Application No.: US12128403Application Date: 2008-05-28
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Publication No.: US07919973B2Publication Date: 2011-04-05
- Inventor: Randy Yach , Tommy Stevens
- Applicant: Randy Yach , Tommy Stevens
- Applicant Address: US AZ Chandler
- Assignee: Microchip Technology Incorporated
- Current Assignee: Microchip Technology Incorporated
- Current Assignee Address: US AZ Chandler
- Agency: King & Spalding L.L.P.
- Main IPC: G01R31/00
- IPC: G01R31/00 ; G01R31/26

Abstract:
A method for monitoring a semiconductor fabrication process creates a wafer of semiconductor chips. Each chip has a one or more diodes. Each diode is addressable as part of an array, corresponds to a physical location of the chip, and is connected in series to a stack. The stack is composed of one ore more vertical interconnects and metal contacts. The diode and associated stack of vertical interconnects is addressed, and the current through each of the stacks of vertical interconnects in an array is measured.
Public/Granted literature
- US20080315195A1 Method and Apparatus for Monitoring VIA's in a Semiconductor Fab Public/Granted day:2008-12-25
Information query