发明授权
- 专利标题: Device under test de-embedding
- 专利标题(中): 被测设备去嵌入
-
申请号: US12037333申请日: 2008-02-26
-
公开(公告)号: US07920987B2公开(公告)日: 2011-04-05
- 发明人: Shun-Meen Kuo , Marcel N. Tutt
- 申请人: Shun-Meen Kuo , Marcel N. Tutt
- 申请人地址: US TX Austin
- 专利权人: Freescale Semiconductor, Inc.
- 当前专利权人: Freescale Semiconductor, Inc.
- 当前专利权人地址: US TX Austin
- 主分类号: G21C17/00
- IPC分类号: G21C17/00
摘要:
A method of determining the intrinsic electrical characteristics of a device under test (DUT) includes determining a set of test measurements for a test structure including the device and determining test measurements for a number of de-embedding test structures. Based on the test measurements, DUT measurements are determined using both open-short and three-step de-embedding processes. The DUT measurements are combined to determine an imperfection error, which is used to adjust the calculations of a four-port de-embedding method. The adjusted calculations provide for a more accurate measurement of the parasitic elements in the test structure, thereby improving the determination of the intrinsic electrical characteristics of the device.
公开/授权文献
- US20090216480A1 DEVICE UNDER TEST DE-EMBEDDING 公开/授权日:2009-08-27
信息查询