发明授权
- 专利标题： Method and system for binding halide-based contaminants
- 专利标题（中）： 用于粘结卤化物基污染物的方法和系统
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申请号： US11218773申请日： 2005-09-01
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公开(公告)号： US07922818B2公开(公告)日： 2011-04-12
- 发明人: Garo J. Derderian , Cem Basceri , Donald L. Westmoreland
- 申请人： Garo J. Derderian , Cem Basceri , Donald L. Westmoreland
- 申请人地址： US ID Boise
- 专利权人： Micron Technology, Inc.
- 当前专利权人： Micron Technology, Inc.
- 当前专利权人地址： US ID Boise
- 代理机构： Fletcher Yoder
- 主分类号： C23C16/08
- IPC分类号： C23C16/08 ; C23C16/06 ; C23C16/22 ; C23C16/14 ; C23F1/00 ; H01L21/306 ; C23C16/44
摘要：
A method and apparatus are presented for reducing halide-based contamination within deposited titanium-based thin films. Halide adsorbing materials are utilized within the deposition chamber to remove halides, such as chlorine and chlorides, during the deposition process so that contamination of the titanium-based film is minimized. A method for regenerating the halide adsorbing material is also provided.
公开/授权文献
- US20060070574A1 Method and system for binding halide-based contaminants 公开/授权日：2006-04-06
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