发明授权
US07923700B2 Sample inspection apparatus, sample inspection method and sample inspection system 有权
样品检验仪器,样品检验方法和样品检测系统

  • 专利标题: Sample inspection apparatus, sample inspection method and sample inspection system
  • 专利标题(中): 样品检验仪器,样品检验方法和样品检测系统
  • 申请号: US11960267
    申请日: 2007-12-19
  • 公开(公告)号: US07923700B2
    公开(公告)日: 2011-04-12
  • 发明人: Hidetoshi Nishiyama
  • 申请人: Hidetoshi Nishiyama
  • 申请人地址: JP Tokyo
  • 专利权人: JEOL Ltd.
  • 当前专利权人: JEOL Ltd.
  • 当前专利权人地址: JP Tokyo
  • 代理机构: The Webb Law Firm
  • 优先权: JP2006-340682 20061219; JP2007-012414 20070123
  • 主分类号: H01J37/20
  • IPC分类号: H01J37/20
Sample inspection apparatus, sample inspection method and sample inspection system
摘要:
Sample inspection apparatus, sample inspection method, and sample inspection system are offered which can give a stimulus to a sample held on a film when the sample is inspected by irradiating it with a primary beam (e.g., an electron beam or other charged-particle beam) via the film. The apparatus has the film, a vacuum chamber, primary beam irradiation column, signal detector, and a controller for controlling the operations of the beam irradiation column and signal detector. The sample is held on a first surface of the film opened to permit access to the film. The vacuum chamber reduces the pressure of the ambient in contact with a second surface of the film. The irradiation column irradiates the sample with the primary beam via the film from the second surface side. The detector detects a secondary signal produced from the sample in response to the irradiation.
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