发明授权
- 专利标题: Nonvolatile memory device using resistance material
- 专利标题(中): 使用电阻材料的非易失性存储器件
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申请号: US12031115申请日: 2008-02-14
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公开(公告)号: US07924639B2公开(公告)日: 2011-04-12
- 发明人: Joon-min Park , Sang-beom Kang , Woo-yeong Cho , Hyung-rok Oh
- 申请人: Joon-min Park , Sang-beom Kang , Woo-yeong Cho , Hyung-rok Oh
- 申请人地址: KR Suwon-si, Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si, Gyeonggi-do
- 代理机构: Volentine & Whitt, PLLC
- 优先权: KR10-2007-0016344 20070216
- 主分类号: G11C7/00
- IPC分类号: G11C7/00 ; G11C29/00
摘要:
The present invention provides a nonvolatile memory device that uses a resistance material. The nonvolatile memory device includes: a stacked memory cell array having a plurality of memory cell layers stacked in a vertical direction, the stacked memory cell array having at least one memory cell group and at least one redundancy memory cell group; and a repair control circuit coupled to the stacked memory cell array, the repair control circuit configured to repair a defective one of the at least one memory cell group with a selected one of the at least one redundancy memory cell group. The features that enable repair improve the fabrication yield of the nonvolatile memory device.
公开/授权文献
- US20080198646A1 NONVOLATILE MEMORY DEVICE USING RESISTANCE MATERIAL 公开/授权日:2008-08-21
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