发明授权
- 专利标题: Exposure control method
- 专利标题(中): 曝光控制方法
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申请号: US12456201申请日: 2009-06-11
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公开(公告)号: US07925152B2公开(公告)日: 2011-04-12
- 发明人: Kuo-Chin Lien , Chun-Hung Shen
- 申请人: Kuo-Chin Lien , Chun-Hung Shen
- 申请人地址: TW Chung-Ho
- 专利权人: Vatics, Inc.
- 当前专利权人: Vatics, Inc.
- 当前专利权人地址: TW Chung-Ho
- 代理机构: Liu & Liu
- 优先权: TW97121631A 20080611
- 主分类号: G03B7/00
- IPC分类号: G03B7/00 ; H04N5/238
摘要:
An exposure control method adjusts an exposure setting used for capturing an image including a foreground object and a background. The foreground object is extracted from the image by an object detection procedure. If the area of the foreground object is greater than a predetermined area value, the brightness of both the foreground object and the background is analyzed. On the contrary, if the area of the foreground object is not greater than the predetermined area value, only the brightness of the background is analyzed. The exposure setting is adjusted according to the analysis result. Accordingly, greater brightness stability is provided during the capture of the following images.
公开/授权文献
- US20090310955A1 Exposure control method 公开/授权日:2009-12-17
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