发明授权
- 专利标题： Projection optics for microlithography
- 专利标题（中）： 微光刻投影光学
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申请号： US11969476申请日： 2008-01-04
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公开(公告)号： US07929114B2公开(公告)日： 2011-04-19
- 发明人: Hans-Juergen Mann
- 申请人： Hans-Juergen Mann
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 优先权： DE102007003307 20070117
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03B27/42 ; G02B21/00 ; G02B5/08 ; G02B5/10
摘要：
A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and including at least one refractive subunit, as well as related systems, components, methods and products prepared by such methods, are disclosed.
公开/授权文献
- US20080170216A1 PROJECTION OPTICS FOR MICROLITHOGRAPHY 公开/授权日：2008-07-17
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