Invention Grant
US07932340B2 Photo radical generator, photo sensitive resin composition and article
有权
光自由基发生器,感光树脂组合物及制品
- Patent Title: Photo radical generator, photo sensitive resin composition and article
- Patent Title (中): 光自由基发生器,感光树脂组合物及制品
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Application No.: US11584115Application Date: 2006-10-20
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Publication No.: US07932340B2Publication Date: 2011-04-26
- Inventor: Katsuya Sakayori
- Applicant: Katsuya Sakayori
- Applicant Address: JP Tokyo-to
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo-to
- Agency: Ladas & Parry LLP
- Priority: JP2003-342340 20030930
- Main IPC: C08F118/02
- IPC: C08F118/02 ; G03F7/04

Abstract:
The invention provides a radical generator, although being a self-cleavage type initiator, which is capable of suppressing volatilization of low molecular weight decomposition materials at the time of light radiation and post-baking, and leaving no low molecular weight decomposition materials in the final product, a photosensitive resin composition and an article using the radical generator. The photoradical generator provided according to the invention contains a compound (a) having one or more self-cleavage type radical-generating parts and one or more ethylenic unsaturated groups in one molecule.
Public/Granted literature
- US20070037096A1 Photo radical generator, photo sensitive resin composition and article Public/Granted day:2007-02-15
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